ICDD Awards - Fellowship Awards

Fellow
The designation of Fellow of the ICDD may be given by the ICDD Board of Directors to individuals who have given their time and talents beyond that normally associated with membership.

Selection process
Nominations are solicited from the ICDD membership and circulated to the Awards Committee for consideration and then presented to the ICDD Board of Directors. Candidates must serve a minimum term of two years in one of the following positions: Board Director, Technical Regional Co-chair, Committee Chair, Technical Subcommittee Chair, or leader in a noteworthy ICDD activity.

Submission Process:

  • Electronic: Names of candidates may be submitted to the Chairman of the ICDD Awards Committee by completing a Nomination Form.
  • Hardcopy: Alternatively, names of candidates may be submitted to the Chairman of the ICDD Awards Committee by mailing a letter of support describing the candidate's major accomplishments relative to the award, signed by the nominator and two others members.

In addition to the nomination form or letter of support, the candidate's curriculum vitae must be sent via e-mail to awards@icdd.com or by mail or fax, using the contact information below:

Chairman, ICDD Awards Committee
c/o The Corporate Secretary
International Centre for Diffraction Data
12 Campus Boulevard
Newtown Square Corporate Campus
Newtown Square, PA 19073-3273 U.S.A.
Fax: 610.325.9823
E-mail: info@icdd.com

Submission Deadline
Submissions must be made by 15 September for the next year's award.

Fellows

Ron Anderson IBM Corporation, Hopewell Junction, NY, USA
Evgeny Antipov Moscow State University, Russia
Peter Bayliss Australian Museum, Australia
Davor Balzar NIST, Boulder, CO, USA
Thomas N. Blanton Eastman Kodak Co., Rochester, NY, USA
Allan Brown Westfield, United Kingdom
Xiaolong Chen Chinese Academy of Sciences, Beijing, People's Republic of China
James Cline National Institute of Standards and Technology (NIST), USA
Cyrus E. Crowder International Centre for Diffraction Data, Newtown Square, PA, USA
Jeffrey N. Dann OSRAM SYLVANIA, Towanda, PA, USA
Jose Miguel Delgado Universidad de Los Andes, Venezuela
Robert E. Dinnebier Max-Planck-Institute for Solid State Research, Germany
Paden F. Dismore Wilmington, DE, USA
 Alwyn Eades Lehigh University, Bethlehem, PA USA
John Faber International Centre for Diffraction Data, Newtown Square, PA, USA
Timothy G. Fawcett International Centre for Diffraction Data, Newtown Square, PA, USA
Gerhard R. Fischer Port Charlotte, FL, USA
C.M. Foris DuPont Central Research & Development, Wilmington, DE, USA
Mary F. Garbauskas G.E. Silicones, Waterford, NY, USA
Herbert Goebel Siemens AG, Germany
Raymond P. Goehner Sandia National Laboratories, Albuquerque, NM, USA
Gregory P Hamill Teradyne, Inc., Boston, MA, USA
Richard L. Harlow E.I. Dupont De Nemours & Co., Wilmington, DE, USA
George J. Havrilla Los Alamos National Laboratory, Los Alamos, NM, U.S.A.
Helein D. Hitchcock Mims, FL, USA
Ting C. Huang Emeritus, IBM, San Jose, CA, USA
Nobuo Ishizawa Tokyo Inst. of Technology, Nagatsuta, Midori, Japan
Gerald G. Johnson, Jr. The Pennsylvania State University, University Park, PA, USA
Howard Jones Pratt & Whitney, East Hartford, CT U.S.A.
James A. Kaduk BP Amoco Chemicals, Naperville, IL, USA
Peter Lee Argonne National Laboratory, Argonne, IL, USA
Shao-Fan Lin Nankai University, People's Republic of China
Daniel Louër Universite de Rennes I, France
Charlotte Lowe-Ma Ford Motor Research Laboratories, Dearborn, MI, USA
Toshmichi Matsukura Sanyo Information System Corp., Japan
Isaac P. Mayer Hebrew University, Israel
Bill Mayo H & M Analytical Services, Allentown, NJ, USA
Andrew M. McDonald Laurentian University, Canada
Ronald C. Medrud Napa, CA, USA
Julian Messick Wallingford, PA, USA
Scott T. Misture NYS College of Ceramics at Alfred University, Alfred, NY, U.S.A.
N. Sanjeeva Murthy University of Vermont, Burlington, VT, U.S.A.
Monte C. Nichols Livermore, CA, USA
Brian H. O'Connor Curtain University of Technology, Australia
Andrew Payzant Oak Ridge Natl. Lab., Oak Ridge, TN, USA
Jeffrey E. Post Smithsonian Institution, Washington, DC, USA
Charles Prewitt Carnegie Institute of Washington, Washington, DC, USA
Susan Quick The Pennsylvania State University, University Park, PA, U.S.A.
David Rafaja Freiberg University of Mining and Technology, Freiberg, Germany
David F. Rendle The Forensic Science Service, United Kingdom
Andrew C. Roberts Geological Survey of Canada, Canada
Earl Ryba Pennsylvania State Univ, University Park, PA, USA
Ann Sabina Geological Survey of Canada, Canada
Paolo Scardi Univ. di Trento, Mesiano, Italy
Walter N. Schreiner IC Laboratories, Katonah, NY, USA
Carlo Segre Illinois Inst. of Tech., Chicago, IL, USA
Joseph V. Smith Chicago, IL, USA
Gregory A. Stephenson Fishers, IN, USA
David J. Taylor Consultant, United Kingdom
Harry G. Thielke Greenville, NC, USA
Brian Toby NIST, Gaithersburg, MD
Hideo Toraya Nagoya Inst. of Technology, Japan
Peter L. Wallace Oro Valley, AZ, USA
Fred Wireko Procter & Gamble Co., Cinncinnati, OH, USA
Winnie Wong-Ng NIST, Gaithersburg, MD, USA
R.A. Young Georgia Institute of Technology, Atlanta, GA, USA
Peter Zavalij Univ. of Maryland, College Park, MD, USA
Leo Zwell Swarthmore, PA, USA